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| Author | Dediu, V. I.; Jiang, Q. D.; Matacotta, F. C.; Scardi, P.; Lazzarino, M.; Nieva, G.; Civale, L. | ||||
| Title | Deposition of MBa2Cu3O7-x thin films by channel-spark method | Type | Journal Article | ||
| Year | 1995 | Publication | Superconductor Science and Technology | Abbreviated Journal | Supercond. Sci. Technol. |
Volume  |
8 | Issue | 3 | Pages | 160 |
| Keywords | Surfaces, interfaces and thin films | ||||
| Abstract | Channel-spark pulsed electron beam deposition (CS), a new deposition method based on a simple and inexpensive system, has been used for preparation of high-quality GdBa2Cu3O7-x, Gd1-xEuxBa2Cu3O7-x and YBa2Cu3O7-x thin films epitaxially grown on NdGaO3 and SrTiO3 substrates. Typical critical temperatures for zero DC resistance lie in the intervals 87-89 K for Y-based films and 91.0-92.6 K for Gd- and GdEu-based ones. The transition widths for the best films are less than 0.5 K. The critical current densities reach the values of 3*106 A cm-2 at 77 K, zero field. | ||||
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| Notes | Approved | no | |||
| Call Number | BT @ gnieva @ | Serial | 458 | ||
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