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Author (up) Salazar Alarcón, L. and Martínez,E. D. and Rodríguez, L. M. and Pastoriza, H. doi  openurl
  Title Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures Type Journal Article
  Year 2016 Publication Advances in Materials Science and Engineering Abbreviated Journal  
  Volume 2016 Issue Pages 5278102  
  Keywords  
  Abstract During SU-8 standard photolithography process, a patterned topography is formed with a characteristic height profile produced by the different shrinkage of the UV exposed and masked regions. We study the change of wettability, film solubility, and topographic modifications on SU-8 films of different thicknesses and show its relevance in the formation of spinning-flow arrays on top layers made from positive photoresists. Also, considerable contrast in film solubility and surface energy as observed from contact angle measurements is produced. Interface diffusion of the photoresists was also observed and followed by Rutherford Back Scattering. We discuss the derivations of the mentioned effects concerning the limitations to multilayered microfabrication processes and possibilities to take advantage of the surface profiles obtained.  
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  Corporate Author Thesis  
  Publisher Hindawi Place of Publication Editor  
  Language Summary Language Original Title  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1687-8434 ISBN Medium  
  Area Expedition Conference  
  Notes Approved no  
  Call Number BT @ hernan @ Serial 731  
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